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Thickness dependence of the properties of indium tin oxide (ITO) FILMS prepared by activated reactive evaporation
Thin films ITO ARE
2010/7/8
Tin doped indium oxide thin films were prepared on glass substrates kept at room temperature, by activated reactive evaporation (ARE). Structural, electrical and optical properties were studied for fi...
小体系[Tin-mH2]x(x=－ 1,0,+1) 的几何结构和电子性质
团簇 广义梯度近似 密度泛函理论 密立根占据数
2012/10/9
利用基于广义梯度近似的密度泛函理论,计算了小体系的[Tin– mH2]x(n =2~7;m=0~22; x =－1, 0, +1）团簇.通过分析各原子的密立根占据数(Atomic Mulliken Occupation, AMO), 发现当Ti n-mH2 团簇带电后,团簇中电荷将重新分配,从而导致了团簇中Ti—Ti 和Ti—H 化学键键长发生了明显的变化,并且团簇的几何结构发生了一定的畸变.同时...
Study of Multilayer Coatings of Ti/TiN/TiC Produced by Pulsed Arc Discharge
Multilayer Coatings of Ti/TiN/TiC Pulsed Arc Discharge
2010/10/27
This work presents a study of multilayered Ti/TiN/TiC thin films obtained using a PAPVD (Plasma Assisted Physical Vapor Deposition) system by pulsed-arc discharge. For this purpose, a titanium target ...