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2018年SPIE极紫外光刻会议(SPIE Extreme Ultraviolet (EUV) Lithography IX)。
For over 40 years, SPIE Advanced Lithography has played a key role in bringing together the micro- and nanolithography community. The addition of other lithography-related technology over the past sev...
The 2017 EUVL Conference, organized by SPIE, EUREKA, imec, and EIDEC, provides a forum to discuss and assess the worldwide status of EUVL technology and infrastructure readiness, as well as opportunit...
Lithography continues to be challenged to extend into ever-shrinking generations, yet remain manufacturable and cost effective. State-of-the-art processes continue with immersion lithography and multi...
Review conference details by clicking on the titles below. These details include paper titles, authors, schedules and abstracts. View Proceedings from last year.SPIE conference papers are published in...
This thesis discusses the full scope of a project exploring the physics of hierarchical clusters of interacting nanomagnets. These clusters may be relevant for novel applications such as multilevel da...
A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usually the same basic la...
The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here w...

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