搜索结果: 1-15 共查到“Lithography”相关记录21条 . 查询时间(0.093 秒)
Lithography-free photonic chip offers speed and accuracy for AI（图）
Artificial Intelligence Electrical Computer Engineering
2023/6/27
Photonic chips have revolutionized data-heavy technologies. On their own or in concert with traditional electronic circuits, these laser-powered devices send and process information at the speed of li...
2018年SPIE极紫外光刻会议（SPIE Extreme Ultraviolet (EUV) Lithography IX）。
2018年SPIE高级光刻会议（SPIE Advanced Lithography）
2018年 SPIE 高级光刻 会议
2017/10/27
For over 40 years, SPIE Advanced Lithography has played a key role in bringing together the micro- and nanolithography community. The addition of other lithography-related technology over the past sev...
2017国际极紫外光刻会议（International Conference on Extreme Ultraviolet Lithography 2017）
2017 国际极紫外光刻 会议
2017/7/6
The 2017 EUVL Conference, organized by SPIE, EUREKA, imec, and EIDEC, provides a forum to discuss and assess the worldwide status of EUVL technology and infrastructure readiness, as well as opportunit...
Symposium II:Lithography and Patterning.
Lithography continues to be challenged to extend into ever-shrinking generations, yet remain manufacturable and cost effective. State-of-the-art processes continue with immersion lithography and multi...
Review conference details by clicking on the titles below. These details include paper titles, authors, schedules and abstracts. View Proceedings from last year.SPIE conference papers are published in...
Optical Proximity Correction (OPC) is a part of a family of techniques called Resolution Enhancement Techniques (RET). These techniques are employed to increase the resolution of a lithography system ...
Hierarchical Multiple Bit Clusters and Patterned Media Enabled by Novel Nanofabrication Techniques - High Resolution Electron Beam Lithography and Block Polymer Self Assembly
Diblock copolymer E-beam lithography Magnetism Multiple state cluster Nanofabrication Self assembly
2014/11/20
This thesis discusses the full scope of a project exploring the physics of hierarchical clusters of interacting nanomagnets. These clusters may be relevant for novel applications such as multilevel da...
Bragg-Angle Diffraction in Slant Gratings Fabricated by Single-Beam Interference Lithography
Slant Grating Single-Beam Interference Lithography Bragg-Angle Diffraction
2013/1/30
A single-beam interference-lithography scheme is demonstrated for the fabrication of large-area slant gratings, which requires exposure of the photoresist thin film spin-coated on a glass plate with p...
EUV is hot topic at SPIE Advanced Lithography 2011（图）
SPIE EUV Advanced Lithography semiconductor industry
2011/4/21
First noted in 1965, Moore's law describes the trend of increasing computer technology, which has continued for more than 50 years and is expected to keep going for decades more in the semiconductor i...
Community readies for SPIE Advanced Lithography amidst market growth indicators（图）
SPIE semiconductor industry EUV
2011/4/22
Bolstered by a record 2010 and continued indicators predicting market growth for the industry, the lithography community is preparing for its annual gathering at SPIE Advanced Lithography. Finding sol...
Reduced basis method for computational lithography
Reduced basis method computational lithography
2010/11/16
A bottleneck for computational lithography and optical metrology are long computational times for near field simulations. For design, optimization, and inverse scatterometry usually the same basic la...
Directional Photofluidization Lithography for Nanoarchitectures with Controlled Shapes and Sizes
Surface plasmon resonance metallic nanostructures azopolymer directional photofl uidization
2015/8/10
Highly ordered metallic nanostructures have attracted an increasing interest in nanoscale electronics, photonics, and spectroscopic imaging. However, methods typically used for fabricating metallic na...
Low Loss Chalcogenide Glass Waveguides Fabricated By Thermal Nanoimprint Lithography
Glass waveguides Nonlinear optics integrated optics
2015/6/5
Low loss thermally nanoimprinted chalcogenide waveguides are demonstrated for the first time,uniquely using a soft PDMS stamp. Losses of 0.24dB/cm at 1550nm limited by Rayleigh scattering were achieve...